کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1666917 | 1518083 | 2012 | 5 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Rapid plasma treatment of polyimide for improved adhesive and durable copper film deposition Rapid plasma treatment of polyimide for improved adhesive and durable copper film deposition](/preview/png/1666917.png)
To improve adhesion at the interface between Cupper (Cu) and polyimide (PI) layers, a PI film surface was treated with a microwave-excited plasma. The Ar/N2 plasma treatment improved the Cu adhesion force to 10 N/cm even for PI substrates with absorbed water. A dramatic improvement of the adhesion durability was achieved by depositing a thin carbon film (C) on the PI substrate as an interlayer between PI and Cu using a microwave plasma followed by treatment with the Ar/N2 plasma prior to the Cu deposition. After a 20-h accelerated aging test, the reduction of the adhesion force for the resulting Cu/C/PI sample was only 10%, whereas that for the Cu/PI sample was 55%. To gain insight into the film properties, the interface between the Cu and PI film was investigated by X-ray photoelectron spectroscopy.
Journal: Thin Solid Films - Volume 521, 30 October 2012, Pages 22–26