کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1667497 1008851 2012 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Orientation-dependent phase separation of GaAsSb epilayers grown by gas-source molecular-beam epitaxy
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Orientation-dependent phase separation of GaAsSb epilayers grown by gas-source molecular-beam epitaxy
چکیده انگلیسی

This work describes a regular solution model that considers the free energy of the surface monolayer to explain the orientation-dependent phase separation in GaAsSb. In the proposed model, only the interaction between the second nearest-neighboring atoms sitting on the same monolayer contributes to the interaction parameter. Consequently, the parameter reduces to Ω/2 and Ω/3 for (111)B GaAsSb and (100) GaAsSb, where Ω denotes the parameter of bulk GaAsSb. By including the strain effect, the proposed model thoroughly elucidates the immiscibility behavior of (111)B GaAsSb and (100) GaAsSb.


► (111)B GaAsSb exhibits severe phase separation than (100) GaAsSb.
► We propose a model to calculate the monolayer free energy of different planes.
► Monolayer model suggests that (111)B GaAsSb has larger interaction parameter.
► Monolayer model including strain well explains the immiscibility of GaAsSb.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 520, Issue 13, 30 April 2012, Pages 4486–4492
نویسندگان
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