کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1667617 1008855 2012 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Rapid thermal annealing of sputter-deposited ZnO/ZnO:N/ZnO multilayered structures
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Rapid thermal annealing of sputter-deposited ZnO/ZnO:N/ZnO multilayered structures
چکیده انگلیسی

Rapid thermal annealing (RTA) of sputter-deposited ZnO/ZnO:N/ZnO multilayered structures formed by a combination of radio-frequency magnetron sputtering and a microwave plasma source was investigated for the fabrication of highly-crystallized ZnO:N films. The assistance of the microwave plasma source resulted in the enhancement of nitrogen incorporation into the ZnO films and the deterioration of film crystallization. On the other hand, crystallization of the ZnO:N layer was improved by RTA with no significant effusion and diffusion of N atoms using a ZnO/ZnO:N/ZnO multilayered structure. The role of the front and bottom ZnO layers during RTA of ZnO/ZnO:N/ZnO multilayered structures is demonstrated.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 520, Issue 10, 1 March 2012, Pages 3729–3735
نویسندگان
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