Microstructure, electrical and optical characteristics of Mg(Zr0.05Ti0.95)O3 thin films grown on Si substrate by sol–gel method

Optical properties and microstructures of Mg(Zr0.05Ti0.95)O3 thin films prepared by sol–gel method on n-type Si(100) substrates at different annealing temperatures have been investigated. The surface structural and morphological characteristics analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscope (AFM) were found to be sensitive to the deposition conditions, such as annealing temperature (600–800 °C). The optical transmittance spectra of the Mg(Zr0.05Ti0.95)O3 thin films were measured by using UV–visible recording spectro-photometer. The diffraction pattern showed that the deposited films exhibited a polycrystalline microstructure. All films exhibited Mg(Zr0.05Ti0.95)O3 peaks orientation perpendicular to the substrate surface and the grain size with the increase in the annealing temperature. The dependence of the microstructure and dielectric characteristics on annealing temperature was also investigated.