کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1668057 1008862 2011 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Epitaxial growth and thermoelectric properties of TiNiSn and Zr0.5Hf0.5NiSn thin films
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Epitaxial growth and thermoelectric properties of TiNiSn and Zr0.5Hf0.5NiSn thin films
چکیده انگلیسی
Due to their exceptional thermoelectric properties Half-Heusler alloys like MNiSn (M = Ti,Zr,Hf) have moved into focus. The growth of single crystalline thin film TiNiSn and Zr0.5Hf0.5NiSn by dc magnetron sputtering is reported. Seebeck and resistivity measurements were performed and their dependence on epitaxial quality is shown. Seebeck coefficient, specific resistivity and power factor for Zr0.5Hf0.5NiSn at room temperature were measured to be 63 μV K− 1, 14.1 μΩ m and 0.28 mW K− 2 m− 1, respectively. Multilayers of TiNiSn and Zr0.5Hf0.5NiSn are promising candidates to increase the thermoelectric figure-of-merit by decreasing thermal conductivity perpendicular to the interfaces. The epitaxial growth of multilayers containing TiNiSn and Zr0.5Hf0.5NiSn is demonstrated by measuring satellite peaks in the X-ray diffraction pattern originating from the additional symmetry perpendicular to the film surface.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 520, Issue 3, 30 November 2011, Pages 1010-1014
نویسندگان
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