کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1668557 1008871 2011 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Deposition of magnesium hydride thin films using radio frequency reactive sputtering
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Deposition of magnesium hydride thin films using radio frequency reactive sputtering
چکیده انگلیسی

Reactive sputter deposition of MgHx thin films was performed using mixed hydrogen–argon plasma. This technique allows in-situ deposition of metal hydride films in contrast to the commonly applied ex-situ hydrogenation of metallic films. Partly transparent films were obtained and the formation of crystalline MgH2 could be observed for thicknesses above about 200 nm. The formation of some metallic Mg in the films could not be avoided. Increased hydrogen loading by increased pressure, H2:Ar ratio or reduced power produced films of porous structure that easily oxidise. More densely packed films remain stable for several months of air exposure. Post-deposition treatments in H-plasma showed evidence of hydrogenation of deposited films without the use of a catalysing capping film. Film properties are studied by X-ray diffraction, scanning electron microscopy and by optical and resistivity measurements.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 519, Issue 18, 1 July 2011, Pages 5949–5954
نویسندگان
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