کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1668780 | 1008875 | 2009 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Structural and mechanical characterization of BCxNy thin films deposited by pulsed reactive magnetron sputtering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Structural and mechanical characterization of BCxNy thin films deposited by pulsed reactive magnetron sputtering Structural and mechanical characterization of BCxNy thin films deposited by pulsed reactive magnetron sputtering](/preview/png/1668780.png)
چکیده انگلیسی
BCxNy thin films deposited at 250 °C by pulsed reactive magnetron sputtering of a B4C target in an Ar/N2 plasma were studied by elastic recoil detection analysis, Fourier transform infrared, Raman, and photoelectron spectroscopy, electron microscopy, and nanoindentation. In the concentration range of 6% to 100% N2 in the sputter plasma the segregation into nanocrystalline hexagonal boron nitride and amorphous sp2 carbon is the dominant process during the film growth. The stoichiometric ratio and structural details of the major phases depend on the N2 concentration in the plasma and have significant influence on the Youngâ²s modulus and the elastic recovery of the BCxNy thin films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 518, Issue 1, 2 November 2009, Pages 77-83
Journal: Thin Solid Films - Volume 518, Issue 1, 2 November 2009, Pages 77-83
نویسندگان
Matthias Krause, Laurent Bedel, Anthony Taupeau, Ulrich Kreissig, Frans Munnik, Gintautas Abrasonis, Andreas Kolitsch, György Radnoczi, Zsolt Czigány, Annick Vanhulsel,