Nanoindentation and nanoscratch behaviour of reactive sputtered deposited W–S–C film

Transition metal dichalcogenides having layered structure are promising self lubricating film and can be considered as substitute for carbon based films in several varieties of environmental conditions. The macrotribological properties of these films are studied extensively and are fairly well understood. However, mechanical and tribological behaviour of these films in millinewton load range have hardly been reported. Study of mechanical and tribological properties at applied load in the millinewton range is useful for possible application related to microelectro mechanical systems or micromechanical assemblies. In view of the above, the present work is undertaken to understand the indentation behaviour and scratch behaviour under constant and low applied load of reactive sputtered deposited W–S–C thin films. Towards that purpose, W–S films containing various amount of C are deposited on 100Cr6 steel using a radio frequency magnetron sputtering unit. The load vs. displacement curves of all these films are generated for four different loads to assess the load effect, substrate effect and size effect on the hardness and the load displacement curves of these films. Curves showing the variation of load as a function of the square of displacement are also evaluated in order to understand deformation and fracture mechanisms of these films and the interface between various microstructures of these films. The scratch behaviour of these films under constant load is determined to examine the friction and wear performance. The results show that the film containing 54 at.% carbon has the maximum hardness and the minimum scratch depth. In contrast, the minimum friction coefficient is exhibited by the film containing the maximum carbon.