کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1668852 1008876 2011 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Preparation of Cr(N,O) thin films by RF reactive unbalanced magnetron sputtering
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Preparation of Cr(N,O) thin films by RF reactive unbalanced magnetron sputtering
چکیده انگلیسی

Chromium oxynitride thin films were deposited by radio-frequency (RF) reactive unbalanced magnetron sputtering at various O2 flow rates onto Si(100) and glassy carbon substrates. The compositions of the thin films were analyzed by Rutherford backscattering spectroscopy. The thin films were found to contain up to 44 at.% oxygen. In Fourier-transform infrared spectra, a peak attributed to the Cr–N bond of CrN was observed, but no peak attributable to the Cr–O bond of Cr2O3 was found. The textures of the thin films were observed by transmission electron microscopy, which revealed that samples had a columnar structure. The hardness of the thin films was measured by nanoindentation. The hardness increased from 20 GPa to a maximum value of 31 GPa with increasing oxygen content.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 519, Issue 11, 31 March 2011, Pages 3497–3500
نویسندگان
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