کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1669492 1008884 2011 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Thermal annealing of protocrystalline a-Si:H
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Thermal annealing of protocrystalline a-Si:H
چکیده انگلیسی

It proves difficult to obtain a set of protocrystalline silicon materials with different characteristics from the same deposition chamber to study the exact nature of these transition region materials. Hot-wire deposited protocrystalline silicon was thus isochronically annealed at different temperatures to investigate the bonded hydrogen configurations and structural disorder. Modeling of optical reflection and transmission spectra with Scout® yielded the optical parameters and infrared spectroscopy confirms that bonded hydrogen remains in the material, with the exception of a longer anneal of six hours at 520 °C. Sub bandgap absorption as inferred from photothermal deflection spectroscopy was related to these characteristics.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 519, Issue 14, 2 May 2011, Pages 4462–4465
نویسندگان
, , , , ,