کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1669667 1008887 2010 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
In situ optical spectroscopy during deposition of Ag:Si3N4 nanocomposite films by magnetron sputtering
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
In situ optical spectroscopy during deposition of Ag:Si3N4 nanocomposite films by magnetron sputtering
چکیده انگلیسی

In situ and real time surface differential reflectance (SDR) spectroscopy is employed to study the growth of metallic Ag and/or dielectric Si3N4 films during deposition by magnetron sputtering. The measurements during Si3N4 sputtering allow determining both the refractive index and the deposition rate. During Ag sputtering, the SDR presents a maximum in the visible range, typical of a surface plasmon resonance (SPR) indicating the 3D growth of silver nanoclusters. After a certain deposition thickness, the SDR change corresponds to a continuous layer growth and allows determining the Ag deposition rate. During Ag/Si3N4 alternate deposition, the SDR spectroscopy enables to follow the SPR modifications (position, amplitude and width) not only during the formation of the Ag nanoclusters but also during their capping by a Si3N4 matrix and during intermediate steps (holding time after the silver sputtering, Si3N4 target ignition and pre-sputtering before the Si3N4 deposition) where significant changes are detected. It suggests possible nanocluster reshaping or physicochemical processes occurring at the nanocluster interface during the different steps.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 518, Issue 10, 1 March 2010, Pages 2637–2643
نویسندگان
, , , , , , ,