کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1669775 1008889 2010 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Pulsed laser deposition of (MoO3)1 − x(V2O5)x thin films: Preparation, characterization and gasochromic studies
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Pulsed laser deposition of (MoO3)1 − x(V2O5)x thin films: Preparation, characterization and gasochromic studies
چکیده انگلیسی
In this study we demonstrate a new composite oxide thin films of (MoO3)1 − x(V2O5)x, x = 0, 0.01, 0.03, and 0.05, fabricated by pulsed laser deposition (PLD). The performance of platinum (Pt) catalyst activated hydrogen gas sensor with modified (MoO3)1 − x(V2O5)x thin films were investigated. The thickness of the (MoO3)1 − x(V2O5)x thin film is about 600-650 nm and its surface has a uniform morphology. Our results show that the gasochromic sensors prepared by (MoO3)0.99(V2O5)0.01 thin film exhibited excellent hydrogen sensibility. The response and recovery time are in the range of 9-15 min for coloration and bleaching at room temperature under H2 atmosphere. The results also show that (MoO3)1 − x(V2O5)x/Pt (x = 0.01, 0.03, 0.05) thin films perform better gasochromic capability than the pristine MoO3/Pt sample.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 519, Issue 5, 30 December 2010, Pages 1552-1557
نویسندگان
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