کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1670001 | 1008894 | 2010 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Investigation of the tribological behavior and its relationship to the microstructure and mechanical properties of a-SiC:H films elaborated by low frequency plasma assisted chemical vapor deposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Investigation of the tribological behavior and its relationship to the microstructure and mechanical properties of a-SiC:H films elaborated by low frequency plasma assisted chemical vapor deposition Investigation of the tribological behavior and its relationship to the microstructure and mechanical properties of a-SiC:H films elaborated by low frequency plasma assisted chemical vapor deposition](/preview/png/1670001.png)
چکیده انگلیسی
Amorphous hydrogenated silicon carbide (a-SiC:H) coatings are promising candidates for tribological applications in the mechanical and aeronautical industries. Alternately high values of hardness H (15 < H < 32 GPa) and elastic modulus E contribute to their good wear resistance as well as to a low friction coefficient. The latter has been found to vary in the range 0.1 < μ < 0.65, depending upon the microstructure of the layers. The roughness of the films determined by atomic force microscopy is in all cases low (Ra ~ 5 nm). Comparisons between the tests carried out in air and those performed under vacuum conditions point to a substantial role of the adhesive part of the friction coefficient in vacuum. They also highlight the role played by the transfer layer between the film and the pin in producing a low friction coefficient for several coatings. This transfer layer consists chiefly of silicon and oxygen (O/Si ~ 2), whilst low quantities of carbon are also present.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 519, Issue 4, 1 December 2010, Pages 1266-1271
Journal: Thin Solid Films - Volume 519, Issue 4, 1 December 2010, Pages 1266-1271
نویسندگان
A. Soum-Glaude, G. Rambaud, S.E. Grillo, L. Thomas,