کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1670048 1008895 2010 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Multiple dip deposition of CdS films prepared by oscillating chemical bath
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Multiple dip deposition of CdS films prepared by oscillating chemical bath
چکیده انگلیسی

Highly oriented CdS thin films with thicknesses greater than 1 μm were deposited using the oscillating chemical bath deposition technique with multiple dips at 75 °C, and from 15 to 75 min as deposition times. Samples with different thicknesses were deposited by repeating the chemical deposition process one, two and three times. All CdS films present the α-greenockite hexagonal structure with (002) as the preferential orientation. Band-gap energy values ranged from 2.35 to 2.42 eV, being the smaller value for the two dip processes. Energy dispersion spectroscopy measurements show good stoichiometry of the CdS films with 4.3 at.% as the maximum Cd variation.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 518, Issue 19, 30 July 2010, Pages 5387–5390
نویسندگان
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