کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1670282 | 1008898 | 2010 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Properties of zirconium oxide films prepared by filtered cathodic vacuum arc deposition and pulsed DC substrate bias
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Thin films of zirconium dioxide have been deposited onto glass and silicon substrates using filtered cathodic vacuum arc deposition under a pulsed negative DC bias. The properties of the films have been investigated using X-ray diffraction, X-ray photoelectron spectroscopy, microhardness testing and optical analysis. It was found that the crystalline phase of the films was strongly influenced by the applied bias and that an amorphous-monoclinic transition occurred on glass substrates for bias values >Â 250Â V. The changes in crystallinity also resulted in an increase in the optical refractive index from 2.09 to 2.22 at 550Â nm. A similar behaviour in the variation of the microhardness with applied pulsed DC bias was also observed, where the hardness increased from 11Â GPa to 16. 5Â GPa.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 518, Issue 18, 1 July 2010, Pages 5078-5082
Journal: Thin Solid Films - Volume 518, Issue 18, 1 July 2010, Pages 5078-5082
نویسندگان
P.J. Martin, A. Bendavid,