Surface mound formation during epitaxial growth of CrN(001)

Single crystal CrN(001) layers, 10 to 160 nm thick, were grown on MgO(001) by reactive magnetron sputtering at growth temperatures Ts = 600 and 800 °C. Insitu scanning tunneling microscopy shows that all layer surfaces exhibit mounds with atomically smooth terraces that are separated by monolayer-high step edges aligned along ( 110) directions, indicating N-rich surface islands. For Ts = 600 °C, the root mean square surface roughness σ initially increases sharply from 0.7 ± 0.2 for a thickness t = 10 nm to 2.4 ± 0.5 nm for t = 20 nm, but then remains constant at σ = 2.43 ± 0.13 nm for t = 40, 80 and 160 nm. The mounds exhibit square shapes with edges along ( 110) directions for t ≤ 40 nm, but develop dendritic shapes at t = 80 nm which revert back to squares at t = 160 nm. This is associated with a lateral mound growth that is followed by coarsening, yielding a decrease in the mound density from 5700 to 700 µm−2 and an initial increase in the lateral coherence length ξ from 7.2 ± 0.6 to 16.3 ± 0.8 to 24 ± 3 nm for t = 10, 20, and 40 nm, respectively, followed by a drop in ξ to 22 ± 2 and 16 ± 2 nm for t = 80 and 160 nm, respectively. Growth at Ts = 800 °C results in opposite trends: σ and ξ decrease by a factor of 2, from 2.0 ± 0.4 and 20 ± 4 nm for t = 10 nm to 0.92 ± 0.07 and 10.3 ± 0.4 nm for t = 20 nm, respectively, while the mound density remains approximately constant at 900 μm−2. This unexpected trend is associated with mounds that elongate and join along ( 100) directions, yielding long chains of interconnected square mounds for t = 40 nm. However, coalescence during continued growth to t = 160 nm reduces the mound density to 100 µm−2 and increases σ and ξ to 2.5 ± 0.1 and 40 ± 2 nm, respectively.