کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1670832 | 1008905 | 2010 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
SiO2 film deposition on the inner wall of a narrow polymer tube by a capacitively coupled μplasma
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: SiO2 film deposition on the inner wall of a narrow polymer tube by a capacitively coupled μplasma SiO2 film deposition on the inner wall of a narrow polymer tube by a capacitively coupled μplasma](/preview/png/1670832.png)
چکیده انگلیسی
SiO2 thin films were deposited on the inner wall of a narrow commercial poly(propylene) tube with inner/outer diameters of 1.0 mm/3.0 mm by plasma-enhanced chemical vapor deposition using He or Ar carrier gases and tetraethoxysilane (TEOS)/O2 feedstock gases at high pressures from 30 kPa to atmospheric pressure and at room temperature. A glow μplasma was generated inside the tube by a radio frequency (RF 13.56 MHz) capacitively coupled discharge. X-ray photoelectron spectra and infrared spectra revealed that the inner surface of the plasma-treated tube was covered by a SiO2 film. Scanning electron microscopy images indicated that the film produced by He/TEOS/O2 μplasma had a smooth surface whereas the surface of the film produced by Ar/TEOS/O2 μplasma appeared granulated. Typical deposition rates of approximately 300 nm/min were obtained by He/TEOS/O2 μplasma at atmospheric pressure and a RF power of 11 W.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 518, Issue 13, 30 April 2010, Pages 3526-3530
Journal: Thin Solid Films - Volume 518, Issue 13, 30 April 2010, Pages 3526-3530
نویسندگان
Hiroyuki Yoshiki, Toshiaki Mitsui, Takaya Sato, Takashi Morinaga, Shoko Marukane,