Growth and structural properties of Mg:C thin films prepared by magnetron sputtering

We investigate the growth and structure properties of Mg:C thin films. The films are prepared using a dc magnetron sputtering discharge where the electrical resistance over the films is monitored during growth in-situ with a four point probe setup. The structural properties of the films are investigated using X-ray diffraction measurements and the elemental composition and binding in the films is determined using elastic recoil detection analysis and X-ray photoelectron spectroscopy. The results show that during co-sputtering the carbon flux influences the initial stages of the film growth. The films are made of polycrystalline magnesium grains embedded in a carbon network, the size of which depends on the carbon content, but amorphous phases cannot be excluded. The XPS measurements show the presence of carbidic carbon whereas X-ray measurements find no Mg:C phases. The overall stability of the films is found to depend on the carbon content, where stable films capped with a 14 nm Pd layer cannot be obtained with carbon content above 18%.