کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
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1671303 | 1008914 | 2009 | 6 صفحه PDF | دانلود رایگان |
Atomic layer deposition (ALD) was used to produce hydroxyapatite from Ca(thd)2 (thd = 2,2,6,6-tetramethyl-3,5-heptanedionato) and (CH3O)3PO onto Si(100) and Corning (0211). Film crystallinity, stoichiometry, possible impurities and surface morphology were determined. The as-deposited films contained significant amounts of carbonate impurities however, annealing at moist N2 flow reduced the carbonate content even at 400 °C. The as-deposited Ca–P–O films were amorphous but rapid thermal annealing promoted the formation of the hydroxyapatite phase. Mouse MC 3T3-E1 cells were used for the cell culture experiments. According to the bioactivity studies cell proliferation was enhanced on as-deposited ALD-grown Ca–P–O films and greatly enhanced on films annealed at 500 °C in comparison with reference cells on borosilicate glass or cell culture polystyrene.
Journal: Thin Solid Films - Volume 517, Issue 20, 31 August 2009, Pages 5819–5824