کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1671582 1008920 2007 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
On the processing–structure–property relationship of ITO layers deposited on crystalline and amorphous Si
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
On the processing–structure–property relationship of ITO layers deposited on crystalline and amorphous Si
چکیده انگلیسی

Indium-tin-oxide (ITO) antireflection coatings were deposited on crystalline Si (c-Si), amorphous hydrogenated Si (a-Si:H) and glass substrates at room temperature (RT), 160 °C and 230 °C by magnetron sputtering. The films were characterised using atomic force microscopy, transmission electron microscopy, angle resolved X-ray photoelectron spectroscopy, combined with resistance and transmittance measurements. The conductivity and refractive index as well as the morphology of the ITO films showed a significant dependence on the processing conditions. The films deposited on the two different Si substrates at higher temperatures have rougher surfaces compared to the RT ones due to the development of crystallinity and growth of columnar grains.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 515, Issue 24, 15 October 2007, Pages 8539–8543
نویسندگان
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