Carbon nanotube-incorporated direct-patternable SnO2 thin films formed by photochemical metal-organic deposition

The electrical property of SnO2 thin film was improved by the incorporation of multi-wall carbon nanotubes (MWNTs). MWNTs were incorporated into SnO2 photosensitive precursor solution and the direct-patternable film was prepared by photochemical metal-organic deposition. The incorporation of MWNTs into SnO2 films slightly reduced the transmittance of SnO2 films due to light scattering by the incorporated MWNTs. In addition, with incorporation of MWNTs, the crystallinity of the SnO2 hybrid films decreased slightly and the film sheet resistance improved due to enhancement of charge mobility because of the π-bonding nature of MWNTs. Direct-patterning of SnO2 hybrid films containing MWNTs was performed without photoresist or dry etching. These results suggest that a micro-patterned system can be simply fabricated at a low cost and the electrical properties of SnO2 films can be improved by incorporating MWNTs.