کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1671881 | 1008924 | 2009 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Growth and characterizations of ZnO nanorod/film structures on copper coated Si substrates
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
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چکیده انگلیسی
ZnO deposits were obtained on electroless copper coated Si substrates using a conventional RF magnetron sputter deposition technique at room temperature. The deposition pressure was varied from 6.67Â Pa to 0.667Â Pa. The RF powers were from 100 to 200Â W and the electrode distance was fixed at 5Â cm. The ZnO deposition time was varied from 1 to 30Â min. The deposits consist of ZnO nanorods and a ZnO film, with the roots of the nanorods embedded in the film. The growth of the nanorods far exceeds the growth of the film in the beginning of the deposition process. The nanorod lengthening rate then slows down and becomes lower than the film growth rate. Effects of sputter deposition parameters on the growth of ZnO nanorods/film structures were also investigated.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 518, Issue 5, 31 December 2009, Pages 1549-1552
Journal: Thin Solid Films - Volume 518, Issue 5, 31 December 2009, Pages 1549-1552
نویسندگان
Wan-Yu Wu, Ming-Ta Chen, Jyh-Ming Ting,