Sputter deposited ZnO nanowires/thin film structures on glass substrate

Integrated ZnO nanowires/thin film structures were grown using radio-frequency magnetron sputter deposition on amorphous glass substrates having an electroless plated copper surface layer. The growth took place under different deposition times and O2/Ar ratios. The substrate was not heated or biased during the deposition. Regardless of the O2/Ar ratio, both nanowires and the film grew simultaneously. However, the growth of the nanowires and the film was diffusion-controlled and reaction-controlled, respectively. On the other hand, the O2/Ar ratio substantially affected the crystal structure and morphology of the resulting ZnO deposits.