Thermodynamic analysis and growth of ZrO2 by chloride chemical vapor deposition

Equilibrium calculations were used to optimize conditions for the chemical vapor deposition (CVD) of zirconia. The results showed zirconia formation would occur at high oxygen to zirconium atomic ratios (> 4), low hydrogen to carbon ratios (< 10), low pressures (< 105 Pa) and high temperatures (> 800 °C). Using these calculations as a guide, single-phase monoclinic zirconia coatings were deposited onto 2-cm diameter α-alumina substrates. The maximum growth rate achieved was 2.46 mg cm− 2 h− 1.