کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1673107 | 1008943 | 2008 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of He addition on the heating characteristics of substrate surface irradiated by Ar thermal plasma jet
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Effect of He addition on the heating characteristics of substrate surface irradiated by Ar thermal plasma jet Effect of He addition on the heating characteristics of substrate surface irradiated by Ar thermal plasma jet](/preview/png/1673107.png)
چکیده انگلیسی
Effect of He addition to Ar as the discharge gas on the substrate surface temperature during thermal plasma jet (TPJ) annealing is investigated. The maximum surface temperature (Tmax) increases from 1370 to 1470 K with increasing He fraction (RHe) from 0 to 28%, then decreases to 1040 K with increasing RHe to 86%. It has been confirmed that the TPJ is efficiently concentrated when He addition is around 30%, which suggests that the increase in Tmax is due to the increase in the power density induced by thermal pinch effect. By adding 30% He and increasing the total gas flow rate to 15.4 L/min, Tmax is increased to 1580 K.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 516, Issue 11, 1 April 2008, Pages 3680–3683
Journal: Thin Solid Films - Volume 516, Issue 11, 1 April 2008, Pages 3680–3683
نویسندگان
T. Okada, S. Higashi, H. Kaku, N. Koba, H. Murakami, S. Miyazaki,