کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1673384 | 1008947 | 2008 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
In situ measurements of optical film parameters and plasma monitoring during reactive sputtering for advanced in-line process control
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: In situ measurements of optical film parameters and plasma monitoring during reactive sputtering for advanced in-line process control In situ measurements of optical film parameters and plasma monitoring during reactive sputtering for advanced in-line process control](/preview/png/1673384.png)
چکیده انگلیسی
In this work the spectroscopic ellipsometry and the reflectometry/transmission measurements together with an advanced plasma monitor were used for inline measurements. All systems were installed in an inline sputtering equipment which enables a continuous deposition process—the condition for a direct feedback to the deposition parameters. The metrology tools were connected by a framework software which used an XML over TCP/IP connection. The setup allowed to control the multilayer deposition using a deposition script and to use the metrology tools for measuring the thicknesses and to correct the deposition rates.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 516, Issue 14, 30 May 2008, Pages 4541–4545
Journal: Thin Solid Films - Volume 516, Issue 14, 30 May 2008, Pages 4541–4545
نویسندگان
U. Richter, W. Hentsch, H. Liepack, R. Kruse, R. Dittrich,