کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1673571 | 1518085 | 2007 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Near-interfacial delamination failures observed in ion-beam-sputtered Ta2O5/SiO2 multi-layer stacks
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Near-interfacial delamination failures observed in ion-beam-sputtered Ta2O5/SiO2 multi-layer stacks Near-interfacial delamination failures observed in ion-beam-sputtered Ta2O5/SiO2 multi-layer stacks](/preview/png/1673571.png)
چکیده انگلیسی
Ion-beam-sputtered Ta2O5/SiO2 multi-layer stacks have been mechanically stressed to failure. The delamination failures do not occur precisely at the layer interfaces. XPS and AFM analyses indicate that the failures occur near the interfaces where SiO2 was deposited on Ta2O5. Delamination is not observed near the interfaces where Ta2O5 was deposited on SiO2. The failure location is 2–3 nm into Ta2O5 layers and can occur randomly near multiple interfaces within a test. The delamination failures were induced by performing tape pull tests over lines scribed into the multi-layer coatings.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 516, Issues 2–4, 3 December 2007, Pages 136–140
Journal: Thin Solid Films - Volume 516, Issues 2–4, 3 December 2007, Pages 136–140
نویسندگان
Marius Grigonis, Wilhelm Hebenstreit, Markus K. Tilsch,