کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1673648 | 1518098 | 2006 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Large area microwave coating technology
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
Microwave plasma enhanced chemical vapour deposition (PECVD) of thin films is the preferred technology when highest deposition rates are desirable. However, large area applications have always suffered from poor film thickness uniformity and unacceptable variations of thin film properties. Coaxial plasma line sources in various arrangements have recently proven their ability to overcome most limitations, which prevented microwave PECVD of becoming a mainstream technology in the field of large area coatings. In this article, the advantages and the potential of the coaxial plasma line sources and suitable vacuum processes are discussed in detail.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 502, Issues 1â2, 28 April 2006, Pages 9-14
Journal: Thin Solid Films - Volume 502, Issues 1â2, 28 April 2006, Pages 9-14
نویسندگان
M. Liehr, S. Wieder, M. Dieguez-Campo,