کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1673747 | 1008952 | 2009 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Combined model for growing mechanism of carbon nanotubes using HFCVD: effect of temperature and molecule gas diffusion
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
Growth of a dense forest of vertically-aligned carbon-nanotubes (VA-CNTs) by a hot filament chemical vapor deposition (HFCVD) method was investigated. The growth of very pure VA-CNTs via the bottom growth mechanism was extremely fast during the initial few minutes, but it slowed down and reached the terminal height of a couple of millimeters. The different temporal variations of the VA-CNT height and growth rates corresponding to different growth stages indicated that a temperature-mediated thermodynamic model, precursor diffusion, and catalyst deactivation were responsible for the VA-CNT growth in respective stages.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 517, Issue 12, 30 April 2009, Pages 3562–3565
Journal: Thin Solid Films - Volume 517, Issue 12, 30 April 2009, Pages 3562–3565
نویسندگان
Nguyen Tuan Hong, Ken Ha Koh, Ngo Thi Thanh Tam, Phan Ngoc Minh, Phan Hong Khoi, Soonil Lee,