کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1673816 | 1008953 | 2008 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Applying HWCVD to particle coatings and modeling the deposition mechanism
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Applying HWCVD to particle coatings and modeling the deposition mechanism Applying HWCVD to particle coatings and modeling the deposition mechanism](/preview/png/1673816.png)
چکیده انگلیسی
A specific HWCVD variant known as initiated chemical vapor deposition or iCVD has been successfully implemented in the encapsulation of fine particles with polymers. Without using a liquid medium, iCVD enabled the coating of fine particles down to the nanoscale without particle agglomeration. More significantly, iCVD was demonstrated as a versatile surface design methodology in achieving the requisite surface properties by either directly depositing the polymer with the required functionality or through subsequent binding of the functionality on a pre-deposited reactive polymer. The ability to adapt iCVD to an increasingly wider array of substrates and polymer chemistries was aided by understanding iCVD reaction kinetics through mechanistic modeling.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 516, Issue 5, 15 January 2008, Pages 674-677
Journal: Thin Solid Films - Volume 516, Issue 5, 15 January 2008, Pages 674-677
نویسندگان
Kenneth K.S. Lau, Karen K. Gleason,