کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1673820 | 1008953 | 2008 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Fabrication of PTFE thin films by dual catalytic chemical vapor deposition method
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Fabrication of PTFE thin films by dual catalytic chemical vapor deposition method Fabrication of PTFE thin films by dual catalytic chemical vapor deposition method](/preview/png/1673820.png)
چکیده انگلیسی
Dependence of catalyzing materials on deposition of polytetrafluoroethylene (PTFE = ”Teflon” in commercial) films by catalytic chemical vapor deposition (Cat-CVD) method is investigated. It has been clarified that Ni-containing catalyzers has a catalyzing effect that can decompose hexafluoropropylene-oxide (HFPO) to form PTFE films. A novel method named Dual Cat-CVD is also proposed. In the method, carbonized and fluorinated surface of Ni-containing catalyzer is removed and refreshed using atomic hydrogen generated by additionally introduced tungsten (W) catalyzer in the same chamber. This Dual Cat-CVD method enables to recover the deposition rate of PTFE films drastically.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 516, Issue 5, 15 January 2008, Pages 687–690
Journal: Thin Solid Films - Volume 516, Issue 5, 15 January 2008, Pages 687–690
نویسندگان
Hiroaki Yasuoka, Masahiro Yoshida, Ken Sugita, Keisuke Ohdaira, Hideyuki Murata, Hideki Matsumura,