α-Cr2O3 template-texture effect on α-Al2O3 thin-film growth

We employ textured α-Cr2O3 thin films as templates for growth of α-Al2O3 by reactive inductively coupled plasma magnetron sputtering. The texture of the template has a strong influence on the nucleation and growth of α-Al2O3. Extended growth of α-Al2O3 at a substrate temperature of 450 °C is obtained using a predominantly [101̄4]-textured α-Cr2O3 template layer, while only limited α-Al2O3 nucleation is seen on a [0001]-textured α-Cr2O3 template.