کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1674398 1008962 2007 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Low threshold current density, highly strained InGaAs laser grown by MOCVD
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Low threshold current density, highly strained InGaAs laser grown by MOCVD
چکیده انگلیسی

It is possible to delay the growth mode transition from a 2-D growth mode to 3-D growth mode (the so-called Stranski–Krastanov growth mode) by means of non-equilibrium growth process employing a low growth temperature and a high growth rate, and adopting a high V/III ratio simultaneously to maintain crystal quality. Record emission wavelengths in multiple InGaAs/GaAs quantum wells without a strain-compensated barrier are grown by metal organic chemical vapor deposition (MOCVD). An InGaAs vertical-cavity surface emitting laser (VCSEL) with emission spectrum up to 1.26 μm under CW operation has been realized. Optimizing the quality of InGaAs QWs leads to a low threshold current density. The qualities of the highly strained InGaAs QWs of this VCSEL structure, such as internal quantum efficiency, internal loss, and transparency current density, were investigated by standard broad area (BA) laser process. Combined with an extensive gain-cavity detuning and the high-quality InGaAs QWs, the InGaAs VCSEL, we believe, is a promising candidate for application to long wavelength, low-cost source fiber-optical communication systems.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 515, Issue 10, 26 March 2007, Pages 4522–4525
نویسندگان
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