کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1674603 | 1008966 | 2008 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Step coverage study of indium-tin-oxide thin films by spray CVD on non-flat substrates at different temperatures
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Step coverage study of indium-tin-oxide thin films by spray CVD on non-flat substrates at different temperatures Step coverage study of indium-tin-oxide thin films by spray CVD on non-flat substrates at different temperatures](/preview/png/1674603.png)
چکیده انگلیسی
Tin-doped In2O3 (indium-tin-oxide) films were deposited on non-flat Si substrates using an original spray chemical vapor deposition (CVD) system. When the deposition temperature was 300–350 °C, ITO films covered all surfaces (top surface, side walls, and bottom; opening size was 1 μm) after being sprayed 50 times. The step coverage decreased as the number of spray increased because the opening size became smaller due to the layered ITO films, and it therefore became increasingly difficult to supply raw materials. The ITO films could not be deposited when the grooves narrowed to less than 0.18 μm. The step coverage of ITO films clearly increased, although the deposition rate decreased due to the decreasing deposition temperature.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 516, Issue 17, 1 July 2008, Pages 5864–5867
Journal: Thin Solid Films - Volume 516, Issue 17, 1 July 2008, Pages 5864–5867
نویسندگان
T. Kondo, Y. Sawada, K. Akiyama, H. Funakubo, T. Kiguchi, S. Seki, M.H. Wang, T. Uchida,