کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1674813 1518118 2005 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Five-source PVD for the deposition of Cu(In1−xGax)(Se1−ySy)2 absorber layers
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Five-source PVD for the deposition of Cu(In1−xGax)(Se1−ySy)2 absorber layers
چکیده انگلیسی
A new five-source PVD system was developed for the deposition of Cu(In1−xGax)(Se1−ySy)2 (CIGSS) thin films. The system allows the independent and controlled deposition of all five elements. In the first part of this paper, we investigate CIGSS formation via a double-layer process of depositing a Cu-S or Cu-Se layer on top of an In-Ga-Se or In-Ga-S layer, respectively. Incomplete intermix of two different chalcopyrite species is observed. In one case, additionally, an enrichment of Ga at the interface between those two layers is observed. In the second part of the paper, films within the complete compositional range of 0
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volumes 480–481, 1 June 2005, Pages 33-36
نویسندگان
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