کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1674958 | 1008972 | 2008 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Phase transformation in NiTiHf shape memory alloy thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
In the present study, amorphous NiTiHf thin films with different compositions were deposited on silicon wafers by using D.C. magnetron sputtering. Crystallization and martensitic transformation characteristics were studied. Crystallization temperatures and activation energy increased with increasing Hf content. The addition of Hf caused larger atomic size mismatch and stronger interactions among constituent elements, thus, increasing the thermal stability of amorphous thin films. With increasing annealing temperature or Hf content, martensitic transformation temperature increased. The results imply that NiTiHf thin films may be used as the potential candidates for high temperature applications in microactuators.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 516, Issue 16, 30 June 2008, Pages 5393–5396
Journal: Thin Solid Films - Volume 516, Issue 16, 30 June 2008, Pages 5393–5396
نویسندگان
Yunxiang Tong, Yong Liu, Jianmin Miao,