کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
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1674961 | 1008972 | 2008 | 5 صفحه PDF | دانلود رایگان |
In this study, we investigate as-deposited Ta3N5–Ag nanocomposite thin films with near-zero temperature coefficients of resistance (TCRs) that are fabricated by a reactive co-sputtering method; these films can be used in thin-film embedded resistors. In these films, the TCR approaches zero due to compensation between Ag (+TCR) and Ta–N (−TCR) at resistivities higher than 0.005 Ω-cm.Taking into account the fact that Ag counterbalances the resistivity of the Ta3N5–Ag thin film, we performed reactive co-sputtering at a nitrogen partial pressure of 55%, corresponding to a resistivity of 0.384 Ω-cm. The resistivity and power density changed, respectively, from 1.333 Ω-cm and 0.44 W/cm2 for silver to 0.0059 Ω-cm and 0.94 W/cm2 for the Ta3N5–Ag thin film. A near-zero TCR of + 34 ppm/K was obtained at 0.94 W/cm2 in the Ta3N5–Ag thin film without heat treatment.
Journal: Thin Solid Films - Volume 516, Issue 16, 30 June 2008, Pages 5409–5413