کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1674987 | 1008972 | 2008 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Plasma properties of CrOx films synthesized by a cathodic arc evaporation process
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Plasma properties of CrOx films synthesized by a cathodic arc evaporation process Plasma properties of CrOx films synthesized by a cathodic arc evaporation process](/preview/png/1674987.png)
چکیده انگلیسی
The plasma in a cathodic arc evaporation process used for the deposition of Cr1âxOx films was studied by an optical emission spectroscopy (OES). With the introduction of Ar and oxygen into the chamber at deposition pressures from 0.7Â Pa to 2.7Â Pa, high density of evaporated chromium catalyzes the decomposition of oxygen reactive gas, and induces the formation of Cr1âxOx films. Optical emission spectra including atomic and ionized Cr, excited and ionized oxygen revealed that excitation, ionization and charge transfer reactions of the Cr-O plasma occurred during the Cr1âxOx deposition process. A simplified empirical model which incorporates the relevant atomic processes in the gas phase with the chemical composition and deposition rate of the deposited Cr1âxOx coating was developed. Rhombohedral Cr2O3 and tetragonal CrO2 were observed in the Cr1âxOx coatings deposited at higher pressure than 1.3Â Pa. The Cr1âxOx coating depicted a dense and compact microstructure with well-attached interface.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 516, Issue 16, 30 June 2008, Pages 5536-5540
Journal: Thin Solid Films - Volume 516, Issue 16, 30 June 2008, Pages 5536-5540
نویسندگان
Yin-Yu Chang, Shun-Jan Yang, Yu-Hsien Liu, Da-Yung Wang,