کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1674994 | 1008972 | 2008 | 6 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Metal organic chemical vapor deposition and investigation of ZnO thin films grown on sapphire Metal organic chemical vapor deposition and investigation of ZnO thin films grown on sapphire](/preview/png/1674994.png)
A new type of large area metal organic chemical vapor deposition (MOCVD) system for the growth of high quality and large size ZnO materials is introduced. Materials properties of the un-doped, n- and p-doped ZnO epi-films grown on sapphire substrates by this MOCVD system are studied by various techniques, including high resolution X-ray diffraction (XRD), UV–Visible optical transmission (OT), photoluminescence (PL) and photoluminescence excitation (PLE), synchrotron radiation X-ray photoelectron spectroscopy (SR-XPS). The wurtzite (w) ZnO crystal structures grown with primary (0002) orientation were identified. Results have shown the high crystalline quality of MOCVD-grown ZnO films, indicated by the narrow XRD, PL and Raman line widths, strong PL signals, sharp OT edge and smooth surface. In particular, high p-type carrier concentration of > 1017 cm− 3 have been achieved besides the good n-type doping in ZnO.
Journal: Thin Solid Films - Volume 516, Issue 16, 30 June 2008, Pages 5571–5576