Structural investigation of thin TiO2 films prepared by evaporation and post‐heating

Thin films of TiO2 have been prepared by reactive evaporation of Ti2O3 at substrate temperatures from 150 °C to 350 °C and by post‐heating at 150 °C to 850 °C. The mass density of the films increases with increasing substrate and annealing temperature. The crystalline structure of the film prepared at 350 °C is anatase and becomes rutile upon annealing at 850 °C. All other films are amorphous as‐prepared and become anatase upon annealing above 250 °C. The crystallinity is higher for films prepared at lower temperature and does not increase with annealing temperature. Coatings with reproducible optical properties are obtained when deposited and post‐annealed at 250 °C.