کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1675254 | 1008977 | 2008 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Disorder, band offsets and dopability of transparent conducting oxides
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
N-type transparent conducting oxides are based on ionic oxides with s-like cation conduction bands. The effect of disorder on their conduction band states is found to be small, because angular disorder has no effect on s states. Aliovalent impurities give rise to shallow states at the conduction band, which leads to an absence of a conduction band tail of localized states. This leads to a higher electron mobility than in typical p state amorphous materials like a-Si, the ability to move the Fermi level well into the conduction band and an absence of electrical instability as in a-Si:H. The band offsets are used to suggest appropriate oxide dielectrics for their thin transistors.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 516, Issue 7, 15 February 2008, Pages 1419–1425
Journal: Thin Solid Films - Volume 516, Issue 7, 15 February 2008, Pages 1419–1425
نویسندگان
John Robertson,