Optical emission studies of the gas phase during the silicon suboxide deposition by reactive r.f. magnetron-sputtering

Correlation functions between the OES signals assigned to silicon and oxygen atoms from plasma (gas phase) and the SiOx layer composition (infrared and energy dispersive X-ray investigated) have been found. Based on these functions, the OES plasma monitoring is proposed as a tool to control in-situ and in direct time the SiOx layer composition.