کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1676161 | 1518099 | 2006 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
sp3's experience using hot filament CVD reactors to grow diamond for an expanding set of applications
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
The present status of sp3 in the area of diamond growth using hot filament CVD is given. After a brief description of the deposition systems being used by sp3 and a discussion of selected applications of sp3's products, the paper focuses on why the hot filament technique was selected as the deposition technique of choice. Topics discussed include ease of scaling, deposition system costs, film growth rate and film uniformity, safety issues, and temperature and process control. Finally, the economics of hot filament reactors compared to other deposition types are discussed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 501, Issues 1–2, 20 April 2006, Pages 65–69
Journal: Thin Solid Films - Volume 501, Issues 1–2, 20 April 2006, Pages 65–69
نویسندگان
James Herlinger,