Low-temperature growth of Si-based organic–inorganic hybrid materials, Si–O–C and Si–N–C, by organic Cat-CVD

This paper describes the recent development of organic catalytic CVD (O-Cat-CVD), which is an extension of the conventional Cat-CVD technique to organic substances. O-Cat-CVD utilizes various types of metal organic (MO) compounds as Cat-CVD sources. Various functional organic–inorganic hybrid materials can be prepared on the basis of MO molecules. The growth and properties of Si-based organic–inorganic materials, Si–O–C and Si–N–C, are described with emphasis on the microscopic chemical-bonding structures depending on the source molecules. The application to a micro Fresnel lens array and selective oxidation mask of Si–O–C and Si–N–C are also demonstrated.