کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1676231 1518099 2006 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Photonic amorphous silicon device technology
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Photonic amorphous silicon device technology
چکیده انگلیسی

Optically smooth hot-wire deposited films were characterized with respect to the photonic application by examination of the slab wave guiding of the room temperature bulk photoluminescence. Films displayed strong photoluminescence as well as strong slab wave guiding of the light to the edge. These properties are consistent with materials suitable for photonic engineering. Waveguide structures were prepared using previously described hydrogen implantation techniques and tested using novel methods. We report the first successful demonstration of refractive index engineered amorphous silicon devices.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 501, Issues 1–2, 20 April 2006, Pages 350–353
نویسندگان
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