Low temperature plasma-chemical treatment of PdCl2 film by atmospheric pressure hydrogen plasma

Palladium (Pd) thin film was prepared on alumina or polymer film substrate using atmospheric pressure hydrogen plasma that reacted with PdCl2 film coated on the substrate. The PdCl2 film was prepared by dip coating the substrate material in PdCl2 solution dissolved in hydrochloric acid. The reaction between the hydrogen and the chloride induced the conversion of the PdCl2 into metallic Pd film at ambient temperature. Hydrogen plasma generated by RF dielectric barrier discharge through H2/He working gas helped very fast dissociation of Pd-Cl bonds to form hydrogen chloride (HCl) gas. Analyses of the film using XRD, SEM and EDX confirmed the phase change and depth profile of the Pd film.