کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1677024 | 1518094 | 2006 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Evidence for direct activation of solid surface by plasma discharge on CFC decomposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Role of the TiO2 catalyst under plasma discharge was investigated on the decomposition of CClF3 in Ar at atmospheric pressure. It was found that the removal rate of CClF3 increased using a plasma reactor packed with TiO2 compared with a conventional reactor. Carbon oxides and hydrogenated compound were detected even in the absence of oxygen and hydrogen sources. In order to clarify the sources of these products, we tried the measurement of chemical species desorbed from TiO2 by plasma discharge, resulting that molecular oxygen and hydrogen were detected in the gas phase. From these findings, it was suggested that the lattice oxygen and the surface OH on the metal oxides could be activated directly by plasma discharge.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volumes 506–507, 26 May 2006, Pages 373–377
Journal: Thin Solid Films - Volumes 506–507, 26 May 2006, Pages 373–377
نویسندگان
A. Ogata, H.-H. Kim, S.-M. Oh, S. Futamura,