کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1677053 1518097 2006 11 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Study of physical and photocatalytic properties of titanium dioxide thin films prepared from complex precursors by chemical vapour deposition
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Study of physical and photocatalytic properties of titanium dioxide thin films prepared from complex precursors by chemical vapour deposition
چکیده انگلیسی

Titanium dioxide (TiO2) thin films were prepared using Titanium [bis(dipiraloymethanate) diisopropoxide] (Ti(dpm)2(OPri)2) and Titanium isopropoxide (Ti(OPri)4) complex compound precursors by Chemical Vapour Deposition (CVD) and photo-assisted CVD. Structural information on TiO2 thin films was obtained in synchrotron radiation experiments: high-resolution Grazing Incidence X-ray Diffraction (GIXRD) and θ–2θ XRD experiments were performed on the high-resolution powder diffractometer at the Hamburg Synchrotron Laboratory. Chemical composition of thin films was studied by high-resolution Laser Ionization Mass Spectrometry technique, surface composition by X-ray Photoelectron Spectroscopy, and surface morphology by Atomic Force Microscopy. Photocatalytic activity of TiO2 thin films was studied using a photocatalytic reactor. The fungicide Fenarimol was chosen as chemical indicator and its degradation kinetics was followed by High Performance Liquid Chromatography.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 503, Issues 1–2, 1 May 2006, Pages 29–39
نویسندگان
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