کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1793437 1023676 2009 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Fabrication and thermal evolution of nanoparticles in SiO2 by Zn ion implantation
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
Fabrication and thermal evolution of nanoparticles in SiO2 by Zn ion implantation
چکیده انگلیسی

SiO2 samples were implanted with 45 keV Zn ions at doses ranging from 5×1015 to 1.0×1017 ions/cm2, and were then subjected to furnace annealing at different temperatures. Several techniques, such as ultra-violet–visible spectroscopy (UV–vis), grazing incidence X-ray diffraction spectroscopy (GXRD) and atomic force microscopy (AFM), have been used to investigate formation of nanoparticles and their thermal evolution. Our results clearly show that Zn nanoparticles could be effectively formed in SiO2 at doses higher than 5×1016 ions/cm2. The subsequent thermal annealing at oxygen ambient could induce the growth of Zn nanoparticles at intermediate annealing temperature range. While at temperature above 600 °C, Zn nanoparticles could be transformed into ZnO, or even Zn2SiO4 nanoparticles. The results have been tentatively discussed in combination with Zn diffusion and migration obtained by Rutherford backscattering spectroscopy (RBS) measurements.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 311, Issue 21, 15 October 2009, Pages 4605–4609
نویسندگان
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