کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5465840 | 1517978 | 2017 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Transparent SnOx thin films fabricated by radio frequency reactive sputtering with a SnO/Sn composite target
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
SnOx thin films are potentially excellent conductive material with large hole mobility and have attracted ever-increasing attention for next generation electronic applications. In this study, SnOx thin films were deposited on a borosilicate glass substrate by radio frequency (rf) reactive sputtering using a SnO/Sn (9:1 mol% ratio) composite target. The composite target was used to produce a chemically stable composition of SnOx thin film while controlling structural defects by chemical reaction between tin and oxygen. The effects of oxygen contents and annealing on various properties of SnOx thin films were studied. The structural analysis was carried out using X-ray photoelectron spectroscopy and X-ray diffraction. The electrical and optical analyses were performed by the Van der Pauw Hall effect measurement and UV/VIS spectrometer, respectively. SnOx thin films at PO2 = 0% (annealed) and 3% (as deposited) exhibited a p-type conductivity of 0.09-0.11 Ωâ 1 cmâ 1, a hole mobility of 0.2-1.2 cm2 Vâ 1 sâ 1, and a hole concentration of ~ 1018 cmâ 3. Also, these thin films showed the transmittance of about 70% and an optical bandgap of 2.75-3.01 eV.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 634, 31 July 2017, Pages 175-180
Journal: Thin Solid Films - Volume 634, 31 July 2017, Pages 175-180
نویسندگان
Cheol Kim, Sungdong Kim, Sarah Eunkyung Kim,